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Iasi Plasma Advanced Research Center (IPARC)
Alexandru Ioan Cuza University of Iasi
Short link:
https://eeris.eu/
ERIF-2000-000C-0743
1302
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Iasi Plasma Advanced Research Center (IPARC) is based on the human and research facility resources developed during four decades of activity in the Laboratory of Plasma Physics from the Faculty of Physics of Alexandru Ioan Cuza University of Iasi. During this period a rich research expertise in topics as plasma diagnosis and modeling, as well as plasma applications in surface treatments, thin film depositions and medicine has been developed. The Center has rich international connections with s...
Lucel
Sirghi
lsirghi@uaic.ro
Professor Dr. Habil.
SCIENTIFIC TEAM
10
Chiper ALINA
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Claudiu COSTIN
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Marius DOBROMIR
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Borcia GABRIELA
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Topala IONUT
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Ilarion MIHAILA
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Valentin POHOATA
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Lucel SIRGHI
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Vasile TIRON
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Ioana-Laura VELICU
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Micro and Nanotechnology Facilities
RI Domain of activity
Materials Synthesis or Testing Facilities
RI Domain of activity
plasma sources and applications, plasma diagnostics and modeling, plasma medicine
RI Domain of activity
Research Data Management Plan:
No information available
Access Policy to Research Infrastructure and Related Services:
No information available
Research Services
Plasma assisted thin film depositions
SERVICE DESCRIPTION:
We use low-pressure magnetron plasma devices working in d.c. r.f. or HiPIMS configurations for deposition of various thin films ranging from metal oxides and mixed ceramics to polymers (DLC, Teflon, polyethylene glycol oxide, etc)
SERVICE PERSONS:
Lucel SIRGHI
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Vasile TIRON
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Ioana-Laura VELICU
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Plasma diagnostics by electrical probes
SERVICE DESCRIPTION:
We have extensive expertise in plasma diagnostics by electrical probes (home made single, double and triple Langmuir probes, emissive probe and electrostatic analyzer) in various low-pressure plasmas (dc, microwave and rf stationary or time-dependent) for measurements of plasma parameters as plasma density, electron temperature, plasma potential, electron energy distribution function and ion energy distribution function. We use a programmable Source Meter Units or PC digital data acquisition boards for digital acquisition of probe I-V characteristics and in house LabView developed software for probe data analysis. Besides, we developed 2D multi-probe systems (up to 64 probes) for spatially resolved measurements of plasma parameters in fusion related devices (Pilot-PSI, Magnum-PSI).
SERVICE PERSONS:
Ilarion MIHAILA
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Lucel SIRGHI
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Claudiu COSTIN
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Plasma diagnostics by laser absorption and laser induced fluorescence
SERVICE DESCRIPTION:
Laser Absorption Spectroscopy (LAS) is a versatile tool in plasma diagnostics which offers the opportunity of controlling relevant plasma parameters like atom density and temperature of selected species and thus may be useful in process control, e.g. in the deposition and etching process. Laser Induced Fluorescence can be used to measure the time and space distribution of sputtered species and their velocity distribution function.
SERVICE PERSONS:
Vasile TIRON
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Ioana-Laura VELICU
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Low-pressure plasma sources for surface treatments and nanotechnology
SERVICE DESCRIPTION:
We have experience in cleaning and hydroxylation of silica surfaces by low-pressure water vapor plasma, silanization of silicon/silica surfaces by activation in plasma and exposure to silane vapor, atmospheric plasma treatment of polymer surfaces and etching of polymer surfaces by low-pressure oxygen plasma. We use reactive ion etching and film deposition with colloidal masks to generate 2D nanopaterns over large areas ( 2 x 2 cm*2)
SERVICE PERSONS:
Lucel SIRGHI
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Atmospheric pressure plasma sources and applications
SERVICE DESCRIPTION:
- dielectric barrier discharge (DBD) systems for surface treatment, in various configurations: symmetric and asymmetric electrode arrangement, enclosed chamber, flow-through system, mobile stage for in-line continuous processing of materials, discharge control in various gaseous mixtures; plasma polymerization reactors
SERVICE PERSONS:
Topala IONUT
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Borcia GABRIELA
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Chiper ALINA
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Plasma modelling and simulations
SERVICE DESCRIPTION:
Our numerical studies target the understanding of fundamental mechanisms in plasma physics as well as the optimization or the design of different plasma reactors. The numerical codes are in-house developed, independently or in collaboration. Some of our codes are listed as follows: (i) 2D axisymmetric (r, z) time-dependent fluid model for a DC planar magnetron discharge, in Ar and Ar-O2 mixture; (ii) 2D time-dependent PIC-MCC code for HiPIMS (High Power Impulse Magnetron Sputtering); (iii) 3D a posteriori Monte Carlo (MC) code used to investigate the electron transport in magnetized discharges; (iv) 0D collisional-radiative model for low-pressure or high-pressure plasma; (v) Monte Carlo Flux Method used to investigate the electron energy distribution function in plasma.
SERVICE PERSONS:
Claudiu COSTIN
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Atomic Force Microscopy
SERVICE DESCRIPTION:
We have an advanced atomic force microscopy laboratory and skilled staff capable of employment of various atomic force microscopy techniques as surface scanning in intermittent contact, non-contact and contact modes and surface force measurements in gaseous media (air/ inert gases with controlled humidity) or in aqueous solutions. We also have experience in AFM techniques as nanoindentation, friction force microscopy and piezoelectric force microscopy.
SERVICE PERSONS:
Lucel SIRGHI
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Laser ablation plasma
SERVICE DESCRIPTION:
We use low-pressure PLD devices for deposition of various thin films (metal, composite materials, oxides, mixed ceramics, polymers). Substrate holder can be heated up to 700 C.
SERVICE PERSONS:
Ilarion MIHAILA
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X-ray photoelectron spectroscopy (XPS)
SERVICE DESCRIPTION:
SERVICE PERSONS:
Marius DOBROMIR
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Plasma diagnostics by ultrafast imaging
SERVICE DESCRIPTION:
- gated ICCD camera coupled to an image intensifier captures images of transient phenomena in pulsed plasma or any type repetitive phenomena, with nanoseconds exposure time
SERVICE PERSONS:
Topala IONUT
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Chiper ALINA
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Investigation of micro/nanomechanical, tribological, and surface magnetic properties of thin films
SERVICE DESCRIPTION:
We have extensive experience with: nanoindentation testing (hardness and Young's modulus), nanoscratch testing (adhesion, cohesion and coefficient of friction), and magneto-optical Kerr (MOKE) effect measurements (surface magnetic properties of soft magnetic thin films).
SERVICE PERSONS:
Ioana-Laura VELICU
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Plasma optical emission spectrometry
SERVICE DESCRIPTION:
- spectroscopic measurements allow identification of the excited species; using appropriate models and methods, electron, vibrational and rotational (gas) temperatures may be calculated using lines and bands intensities
SERVICE PERSONS:
Topala IONUT
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Valentin POHOATA
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UV-Vis, FTIR and Raman Spectroscopy
SERVICE DESCRIPTION:
- broad band absorption spectroscopy in various spectral ranges (e.g. UV, Vis and IR) is used to obtain information on chemical structure of films or gases
SERVICE PERSONS:
Topala IONUT
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Valentin POHOATA
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Research Equipment
Magnetron plasma sputtering systems
CATALOG NAME:
DESCRIPTION:
In the IPARC lab there are 3 magnetron sputtering deposition systems composed of the following major items: Ultra-high vacuum chamber Pumping System (Turbo-Molecular Pump with Dry Scroll Pump) Vacuum Measurement System (Full Range Vacuum Gauges) Gas Feeding System by Mass Flow Controllers 3”, 2” and 1” Magnetron Sputter Guns with Manual Shutter Gas Plasma Generation Sources (DC, RF-CCP, HiPIMS) Quartz Crystal Thickness Monitor Substrate Heater (from room temperature to 900 ºC) Water Chiller (Close Loop Design) The systems are suitable for reactive deposition of nano-structured and nano-composited of conductive, semiconductive and insulating films.
PRODUCER:
home made
PRODUCTION YEAR:
2014
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (122.93 kb)
Low pressure plasma cleaning and functionalization systems
CATALOG NAME:
DESCRIPTION:
Low pressure water vapor plasma system for cleaning and hydroxylation of silicon/silica surfaces uses a dc glow discharge in water vapoor (01-0.3 Torr) at a discharge voltage of about 500 V and a discharge current density of 10 mA/30cm^2 .
PRODUCER:
home made
PRODUCTION YEAR:
2012
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Electrical probe plasma diagnostics systems with programmabile source measure unit
CATALOG NAME:
DESCRIPTION:
A key component of the plasma diagnostics system by electrical probes, apart of the electrical probes (home made single, double and triple Langmuir probes, emissive probe and electrostatic analyzer), is the source meter unit (SMU) that provides probe biasing voltage in the range -200V +200 V, and measure the intensity with high sensitivity instrument incorporated into the unit. We use a SMU 2600A System SourceMeter instrument from Keithley’s as a bench-top I-V characterization completely programmable by PC. Alternatively, we have several PC digital data acquisition boards ready for use in various electrical probe measurements for plasma diagnostics. We have in house LabView developed software for probe data analysis.
PRODUCER:
home made
PRODUCTION YEAR:
2000
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Radio frequency power supply unit
CATALOG NAME:
Cesar 133 57020015-00G
DESCRIPTION:
CESAR 133 generators are Class E Switched mode Amplifiers for Radio Frequency (CESAR), a new generation of versatile RF power supplyes for semiconductor production and general plasma processing. The 13.56 MHz generator employs parallel excited circuitry in a compact 19’ rack mountable designs. Typical applications include sputtering, reactive ion etching, rf bias, plasma polymerization and plasma surface treatment. Frequency 13.56 +- 0.005% Minimum output power 3 W Maximum output power 300 W Maximum reflected power 100 W Load impedance 50 Ohmi RF pulse frequency 1Hz to 30 KHz RF pulse duty cycle 1% to 99%
PRODUCER:
AE Advanced Energy
PRODUCTION YEAR:
2014
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Microwave power supply unit
CATALOG NAME:
SAIREM BMP Ked B
DESCRIPTION:
Microwave generator 2.45GHz, up to 2000W, connected to a waveguide with an applicator that surround a quartz tube or connected to an torch module working mode: traveling wave guide(low pressure) microwave torch (atmospheric pressure)
PRODUCER:
Sairem
PRODUCTION YEAR:
2006
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Direct current power supply units
CATALOG NAME:
LNC 1200-50, LNC 3000-20, PNC 1500-800, PNC 3500-500, PNC 1500-400
DESCRIPTION:
In our lab we have several direct current Heinzinger high voltage dc power units
PRODUCER:
Heinzinger
PRODUCTION YEAR:
2012
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (766.82 kb)
Pulsed laser ablation deposition system
CATALOG NAME:
DESCRIPTION:
The PLD system consist of a vacuum chamber pumped down (turbomolecular pump + preliminary pump) to 10^-5 Torr. Target holder system permits the translation and rotation of a 1" target to use the entire target surface for ablation. Substrate hold can be positioned in front of the target at various distances and can be heated up to 700oC. The laser radiation used is the 3rd harmonic of a NdYAG laser (from CERNESIM) with a pulse of 5ns and energy up to 180mJ.
PRODUCER:
home made (IPARC)
PRODUCTION YEAR:
2010
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Laser absorption and induced fluorescence plasma diagnostics system
CATALOG NAME:
Tunable Diode Laser System TOPTICA DL 100
DESCRIPTION:
Two Diode Laser Systems (TOPTICA DL 100) for 2 spectral domains (370–450 nm and 650–850 nm) for Laser Absorption Spectroscopy (LAS) and Laser Induced Fluorescence (LIF) measurements. The systems consist of: laser heads, control units, Fabry-Perot Interferometers, laser wavelength meter, photo-detectors, optical spectrometer, optical table, lenses, beam splitters, diaphragms, mirrors, displacement systems.
PRODUCER:
Toptica Photonics
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (849.06 kb)
Atomic force microscope (NT-MDT, Russia)
CATALOG NAME:
SOLVER PRO M
DESCRIPTION:
-in air: STM/ Atomic Force Microscopy (AFM) (contact + semicontact + noncontact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging/DC&AC Magnetic Force Microscopy (MFM) / DC&AC Electrostatic Force Microscopy (EFM)/ Scanning Capacitance Microscopy (SCM)/ Kelvin Probe Microscopy (KPM)/ Spreading Resistance Imaging (SRI)/ Atomic Force Acoustic Microscopy (AFAM); -in liquid: Atomic Force Microscopy (AFM) (contact + semicontact + noncontact)/ Lateral Force Microscopy (LFM)/ Phase Imaging mode/ Force Modulation mode/ Adhesion Force Imaging. -Scanning by probe for samples up to ∅ 100x20 mm -Scanner 100x100x7 μm (±10%) -Active vibration isolation system:
PRODUCER:
NT-MDT, Russia
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (82.58 kb)
Atomic force Microscope (Park , South Korea)
CATALOG NAME:
DESCRIPTION:
Complete Atomic Force Microscope system for small and medium size samples, consisting of completely decoupled XY & Z scanners using flexure guided scan system for all three axes, closed/open-loop scan, XY flexure scanner with zero background curvature, XE AFM head, direct on-axis optics, high resolution digital CCD camera with digital zoom, motorized Z stage, manual focus stage, precision manual XY sample stage, control electronics, computer, software and cantilevers. XY scanner with closed-loop feedback control - Single module parallel-kinematics flexure stage - Scan range: 50 × 50 μm - Resolution: < 0.6 nm (closed-loop), < 0.01 nm (open-loop) Z scanner with closed-loop feedback control - Guided flexure stage - Scan range: 12 μm - Noise level: 0.02 nm (typical) / 0.05 nm (maximum) SLD XE AFM Head detects the deflection of a cantilever using SLD (Super Luminescence Diode) for topography feedback - Center wavelength: 830 nm ▪ Includes a high servo Z-scanner with guided flexure stage. Direct On-Axis Optical Microscope. Provides the intuitive on-axis top view of a sample with unprecendented clarity ▪ The optical path from the sample to the high resolution digital CCD camera is an unobstructed straight line.
PRODUCER:
Park Systems
PRODUCTION YEAR:
2012
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (646.89 kb)
Spin Coating Machine
CATALOG NAME:
WS-650 SPIN PROCESSOR
DESCRIPTION:
The Laurell WS-650-23B spin coater is compact and packed with advanced features. This coater system accommodates up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer). The housing for this system is typically made from a solid co-polymer blend exclusive to Laurell Technologies. Unlike pure Natural Polypropylene, this material is able to resist solvents and strong acids and bases. The closed bowl design, coupled with the precision of the process controller, allows most coating materials to dry in a quiescent state, increasing uniformity and minimizing particle contamination. The upper plenum closes inside the base to provide an overlapping seal, and the inside of the lid has a special gutter to channel fluid to the rear of the system to discourage chemicals from accidentally dripping onto the substrate
PRODUCER:
Laurell Technologies
PRODUCTION YEAR:
2014
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Optical spectrometer (low and medium resolution)
CATALOG NAME:
Avantes
DESCRIPTION:
PRODUCER:
PRODUCTION YEAR:
2014
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Optical spectrometer (high resolution)
CATALOG NAME:
TRIAX 550
DESCRIPTION:
- range: 200-1000 nm; max. resolution 0,01 nm; gratings 600 /mm and 2400 /mm
PRODUCER:
HORIBA
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
High voltage pulse generator for HiPIMS deposition
CATALOG NAME:
DESCRIPTION:
Average power: 10-200 W Pulse Voltage: 400 – 1000 V Preionization Voltage: ≈300 V Pulse Current : ≈50 A Pulse Width: 2 – 200 µs Pulse frequency: 0.1 – 10 kHz HiPIMS is a sputtering technique where a high density power (kW/cm2) applied to the magnetron target in unipolar pulses at low duty cycle and low repetition frequency facilitates generation of high-density plasma with high ionization degree and high-energy tail of the sputtered species. The high ion-to-neutral ratio and intense energetic particle bombardment enable the deposition of ultra-dense and smooth metallic and compound films and make possible to tailor the phase composition, microstructure and morphology, the elemental composition, and subsequently the properties and functionality of the deposited coatings.
PRODUCER:
home made
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
High voltage signal amplifier
CATALOG NAME:
TREK PD07016
DESCRIPTION:
300W, +/-10 kV d.c. or c.c.; 10 V max. input; max. input impedance 10 kOhms; signal rise time > 1kV/us
PRODUCER:
TREK
PRODUCTION YEAR:
2007
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
High voltage pulse generator for surface DBD plasma
CATALOG NAME:
DESCRIPTION:
PRODUCER:
home made
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
XPS machine
CATALOG NAME:
PHI 5000 VersaProbe
DESCRIPTION:
PRODUCER:
Φ ULVAC-PHI, INC.
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Thermionic Vacuum Arc System
CATALOG NAME:
DESCRIPTION:
Thermionic Vacuum Arc system composed of the following major items: Ultra-high vacuum chamber Pumping System (Turbo-Molecular Pump with Dry Scroll Pump) Vacuum Measurement System (Full Range Vacuum Gauges) Electron Beam Gun High Voltage Power Supply Quartz Crystal Thickness Monitor Water Chiller (Close Loop Design) Thermionic Vacuum Arc produces highly ionized plasma from virtually all solid metallic elements. Thermionic Vacuum Arc plasma is characterized by highly energetic metallic ions which favor deposition of superior film density with excellent adhesion and decreased roughness.
PRODUCER:
home made
PRODUCTION YEAR:
2007
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Contact angle measurement system
CATALOG NAME:
DESCRIPTION:
PRODUCER:
home made
PRODUCTION YEAR:
2005
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Digital Oscilloscopes
CATALOG NAME:
LeCroy waveSurfer 434, Tektronix TDS 2024B, TDS5034B
DESCRIPTION:
PRODUCER:
Lecroy, Tektronix
PRODUCTION YEAR:
2005
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (3798.73 kb)
Wave Function Generator
CATALOG NAME:
Tektronix AFG 3022C, Tektronix AFG3022B
DESCRIPTION:
PRODUCER:
Tektronix
PRODUCTION YEAR:
2014
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (385.33 kb)
Voltage and Current Probes
CATALOG NAME:
Tektronix P6015A, Pearson 6485
DESCRIPTION:
PRODUCER:
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
UV-Vis Spectrometer
CATALOG NAME:
Thermo Scientific Evolution 300
DESCRIPTION:
- wavelength range: 190 to 1100nm
PRODUCER:
Thermo Scientific
PRODUCTION YEAR:
2010
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Raman Spectrometer
CATALOG NAME:
Ava-Raman-785TEC system
DESCRIPTION:
- 500 mW 785 nm TEcontrolled diode laser, grating (100-3500cm-1), slit 25 um, AvaSoft-Raman; 1/2” focusing probe, 200 μm excitation fiber and 400 μm read fiber, 10 mm focal length
PRODUCER:
Avantes
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Phone:
+40(232)201024
Fax:
Carol I
,
11
,
Iasi
700506
,
Iasi
Romania
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